Preparation of new photosensitive ZrO2 gel films using hydroxyl-substituted aromatic ketones as chemical modification reagents and their patterning

Journal of Sol-Gel Science and Technology

Volumn 31, Issue 1-3 SPEC.ISS., 2004, Pages 253-256

  Noma, Naoki ^a   Yamazaki, Saori ^a   Tohge, Noboru ^a  

^a KINKI UNIVERSITY   (Japan)

Author keywords

Absorption band; Chemical modification; Patterning; Photosensitivity; UV irradiation

Indexed keywords

CHELATION; CHEMICAL MODIFICATION; CONDENSATION; ELECTRONS; GELS; KETONES; LEACHING; PHOTOSENSITIVE GLASS; SUBSTITUTION REACTIONS; ULTRAVIOLET RADIATION; ZIRCONIUM COMPOUNDS;

ABSORPTION BAND; PATTERNING; REAGENTS; UV-IRRADIATION;

THIN FILMS;

EID: 9244248113     PISSN: 09280707     EISSN: None     Source Type: Journal    
DOI: 10.1023/B:JSST.0000047998.79472.40     Document Type: Article

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