Shave-off depth profiling: Depth profiling with an absolute depth scale

Applied Surface Science

Volumn 252, Issue 19, 2006, Pages 7293-7296

  Nojima, M ^a,b   Maekawa, A ^a,b   Yamamoto, T ^a,b   Tomiyasu, B ^b   Sakamoto, T ^c   Owari, M ^b   Nihei, Y ^a  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

^b INSTITUTE OF INDUSTRIAL SCIENCE   (Japan)

^c KOGAKUIN UNIVERSITY   (Japan)

Author keywords

Depth profiling; FIB; Shave off; SIMS

Indexed keywords

DYNAMIC RANDOM ACCESS STORAGE; MICROMACHINING; OPTICAL RESOLVING POWER; SECONDARY ION MASS SPECTROMETRY;

DEPTH PROFILING; ION BEAM (FIB) MICRO-MACHINING PROCESS; SHAVE-OFF;

ION BEAMS;

EID: 33747203515     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2006.02.144     Document Type: Article

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