Substituent effect of photo and thermal decomposition rate of diazocompounds with inclusion compounds

Journal of Photopolymer Science and Technology

Volumn 19, Issue 1, 2006, Pages 129-133

  Harada, Kieko ^a   Aimaiti, Wumaierjiang ^a   Nakada, Masahiro ^a   Morihiro, Yukari ^b   Narita, Tadashi ^b   Aoki, Reiko ^c   Kushida, Masahito ^c   Sugita, Kazuyuki ^c  

^a CHIBA INSTITUTE OF TECHNOLOGY   (Japan)

^b SAITAMA INSTITUTE OF TECHNOLOGY   (Japan)

^c CHIBA UNIVERSITY   (Japan)

Author keywords

cyclodextrin; 18 crown 6; Acid generator; Photosensitive diazo compound; Polyethylene glycol 300

Indexed keywords

EID: 33746923400     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.19.129     Document Type: Article

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