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Volumn 16, Issue SUPPL., 2006, Pages

Preparation of BiFeO3 thin films by pulsed laser deposition method

Author keywords

BiFeO3 thin films; PLD; Pt(111) TiO2 SiO2 Si(100) substrates; Structural and dielectric properties

Indexed keywords

DIELECTRIC PROPERTIES; PULSED LASER DEPOSITION; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

EID: 33746806371     PISSN: 10036326     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1003-6326(06)60158-1     Document Type: Article
Times cited : (17)

References (12)
  • 7
    • 0344514646 scopus 로고    scopus 로고
    • 3 thin films prepared by pulsed-laser deposition
    • 3 thin films prepared by pulsed-laser deposition [J]. Appl Phys Lett, 2003, 83(19): 3981-3983.
    • (2003) Appl Phys Lett , vol.83 , Issue.19 , pp. 3981-3983
    • Yun, K.Y.1    Nagao, M.2    Okuyam, M.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.