Electronic properties of plasma hydrogenated diamond surfaces: A microscopic study

Diamond and Related Materials

Volumn 15, Issue 9, 2006, Pages 1374-1377

  Rezek, B ^a   Nebel, C E ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Diamond film; Plasma CVD; Surface electronic properties

Indexed keywords

ATOMIC FORCE MICROSCOPY; DIAMOND FILMS; ELECTRON EMISSION; ELECTRONIC PROPERTIES; HYDROGENATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; SCANNING ELECTRON MICROSCOPY; SURFACE STRUCTURE;

HYDROGEN PLASMA; KELVIN FORCE MICROSCOPY; SURFACE ELECTRONIC PROPERTIES;

DIAMONDS;

EID: 33746644163     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2005.10.002     Document Type: Article

References (13)

1. Landstrass M.I., and Ravi K.V. Appl. Phys. Lett. 55 (1989) 975
2. Takeuchi D., Riedel M., Ristein J., and Ley L. Phys. Rev., B. 68 (2003) 041304R
3. Rezek B., Sauerer C., Nebel C.E., Stutzmann M., Ristein J., Ley L., Snidero E., and Bergonzo P. Appl. Phys. Lett. 82 (2003) 2266
4. Himpsel F.J., Knapp J.A., van Vechten J.A., and Eastman D.E. Phys. Rev., B. 20 (1979) 624
5. Maier F., Ristein J., and Ley L. Phys. Rev., B. 64 (2001) 65411
6. Hayashi K., Yamanaka S., Watanabe H., Sekiguchi T., Okushi H., and Kajimura K. J. Appl. Phys. 81 (1997) 744
7. Jiang N., and Ito T. J. Appl. Phys. 85 (1999) 8267
8. Williams O.A., and Jackman R.B. Semicond. Sci. Technol. 18 (2003) S34
9. Tsuno T., Imai T., Nishibayashi Y., Hamada K., and Fujimori N. Jpn. J. Appl. Phys. 30 (1991) 1063
10. Nakamura J., Fukumoto S., Teraji T., Murakami H., and Ito T. Appl. Surf. Sci. 216 (2003) 59
11. Nonnenmacher M., O'Boyle M.P., and Wickramasinghe H.K. Appl. Phys. Lett. 58 (1991) 2921
12. Rezek B., Nebel C.E., and Stutzmann M. Diamond Relat. Mater. 13 (2004) 740
13. Kwok D., and Neumann A. Adv. Colloid Interface Sci. 81 (1999) 167