Surface tension and self-diffusion coefficient of liquid Si and Ge

Journal of Crystal Growth

Volumn 293, Issue 2, 2006, Pages 294-298

  Lu, H M ^a,b   Wang, T H ^a,b   Jiang, Q ^a,b  

^a Jilin University   (China)

^b JILIN UNIVERSITY   (China)

Author keywords

A1. Diffusion; A1. Surface tension; B2. Semiconducting germanium; B2. Semiconducting silicon

Indexed keywords

CRYSTALS; DIFFUSION; MATHEMATICAL MODELS; SEMICONDUCTING SILICON; SURFACE TENSION; THERMAL EFFECTS;

LIQUID GERMANIUM; LIQUID SILICON; LIQUID VISCOSITY; SELF-DIFFUSION COEFFICIENTS;

SEMICONDUCTING GERMANIUM;

EID: 33746606900     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2006.06.006     Document Type: Article

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