Spectroscopic ellipsometry characterization of ultrathin silicon-on-insulator films

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 4, 2006, Pages 2156-2159

  Price, J ^a   Diebold, A C ^a  

^a SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FILM THICKNESS; SPECTROSCOPIC ELLIPSOMETRY; THICKNESS; TRANSITION ENERGY;

ELECTRONS; ELLIPSOMETRY; FILM GROWTH; REGRESSION ANALYSIS; SILICON; SILICON ON INSULATOR TECHNOLOGY; SPECTROSCOPIC ANALYSIS;

ULTRATHIN FILMS;

EID: 33746558660     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2213265     Document Type: Article

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