Measurements and modeling of SiCl4 combustion in a low-pressure H2/O2 flame

Combustion and Flame

Volumn 146, Issue 3, 2006, Pages 407-418

  Moore, Teresa ^a   Brady, Brian ^a   Martin, L Robbin ^a  

^a AEROSPACE CORPORATION   (United States)

Author keywords

Combustion synthesis; Flame synthesis; Kinetics mechanism; Low pressure flame; SiCl4; Silicon tetrachloride

Indexed keywords

COMPUTER SIMULATION; CONCENTRATION (PROCESS); FLUORESCENCE; HYDROGEN PEROXIDE; MATHEMATICAL MODELS; REACTION KINETICS; SILICON COMPOUNDS;

COMBUSTION SYNTHESIS; FLAME SYNTHESIS; KINETICS MECHANISM; LOW-PRESSURE FLAME; SICL4; SILICON TETRACHLORIDE;

FLAME RESEARCH;

HYDROGEN; OXYGEN; SILICON DERIVATIVE;

COMPUTER SIMULATION; CONCENTRATION (PROCESS); FLAME RESEARCH; FLUORESCENCE; HYDROGEN PEROXIDE; MATHEMATICAL MODELS; REACTION KINETICS; SILICON COMPOUNDS;

ARTICLE; COMBUSTION; FLUORESCENCE; KINETICS; LAMINAR FLOW; LASER; MEASUREMENT; MODEL; PRESSURE; PRIORITY JOURNAL; TEMPERATURE;

EID: 33746491298     PISSN: 00102180     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.combustflame.2006.06.003     Document Type: Article

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