Ab initio study on the rate constants of SiCl4 + H → SiCl3 + HCl

Physical Chemistry Chemical Physics

Volumn 3, Issue 6, 2001, Pages 965-969

  Zhang, X ^a   Ding, Y H ^a   Li, Z S ^a   Huang, X R ^a   Sun, C C ^a  

^a JILIN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CHLORIDE; SILICON DERIVATIVE;

ARTICLE; CALCULATION; ENERGY; ENTHALPY; PHASE TRANSITION; REACTION ANALYSIS; TEMPERATURE DEPENDENCE;

EID: 0035111494     PISSN: 14639076     EISSN: None     Source Type: Journal    
DOI: 10.1039/b006856j     Document Type: Article

References (13)