Proximity effect of electron beam lithography on single-electron transistors

Pramana - Journal of Physics

Volumn 67, Issue 1, 2006, Pages 57-65

  Hu, Shu Fen ^a   Huang, Kuo Dong ^b   Wan, Yue Min ^b   Sung, Chin Lung ^a  

^a NATIONAL NANO DEVICE LABORATORIES   (Taiwan)

^b I SHOU UNIVERSITY   (Taiwan)

Author keywords

Nanostructures; Semiconductors; Transport

Indexed keywords

COULOMB BLOCKADE; ELECTRIC POTENTIAL; ELECTRON BEAM LITHOGRAPHY; ELECTRONS; MOS DEVICES; NANOSTRUCTURED MATERIALS;

NANOELECTRONICS; NANOSTRUCTURES; PROXIMITY EFFECTS; TRANSPORT;

TRANSISTORS;

EID: 33746305886     PISSN: 03044289     EISSN: 03044289     Source Type: Journal    
DOI: 10.1007/s12043-006-0036-7     Document Type: Conference Paper

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