High-temperature properties of silicon nitride with Lu-Si-O-N grain boundary phases

Key Engineering Materials

Volumn 317-318, Issue , 2006, Pages 425-428

  Yamamoto, Y ^a   Nishimura, T ^a   Hirosaki, N ^a   Guo, S ^b   Cao, J ^c   Mitomo, M ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b INSTITUTE OF INDUSTRIAL SCIENCE   (Japan)

^c JAPAN FINE CERAMICS CENTER   (Japan)

Author keywords

Creep; Lu2O3; Oxidation; Silicon nitride; Strength

Indexed keywords

BRITTLE FRACTURE; CERAMIC MATERIALS; GRAIN BOUNDARIES; HIGH TEMPERATURE EFFECTS; HOT PRESSING; OXIDATION RESISTANCE; TENSILE STRESS;

CREEP LIFETIME; LU2O3; STRESS-STRAIN CURVE;

SILICON NITRIDE;

EID: 33746070370     PISSN: 10139826     EISSN: 16629795     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/kem.317-318.425     Document Type: Conference Paper

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