Oxidation behaviour and strength degradation of a Yb2O3−SiO2−doped hot-pressed silicon nitride between 1200 and 1500°C

Philosophical Magazine A: Physics of Condensed Matter, Structure, Defects and Mechanical Properties

Volumn 82, Issue 16, 2002, Pages 3027-3043

  Guo, Shuqgi ^a   Irosakti, Naotoh ^a   Nishimura, Toshiuyki ^a   Mamoto, Yoshinobyua ^a   Itomo, Mamormu ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; BENDING STRENGTH; DEGRADATION; GRAIN BOUNDARIES; HOT PRESSING; INTERFACES (MATERIALS); OXIDATION; OXIDATION RESISTANCE; SILICA; SINTERING; YTTERBIUM COMPOUNDS;

CRISTOBALITE; REFRACTORINESS; STRENGTH DEGRADATION; YTTERBIUM OXIDES;

SILICON NITRIDE;

EID: 0037058456     PISSN: 01418610     EISSN: None     Source Type: Journal    
DOI: 10.1080/01418610208239632     Document Type: Article

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