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Volumn 78, Issue 1, 2006, Pages 223-232

Intrinsic properties of (100)/(001)-oriented epitaxial PZT thin films grown on (100)SI and (100)SrTiO3 substrates

Author keywords

Electrical properties; Epitaxial film; MOVCD; Pb(Zr,Ti)O3

Indexed keywords

EPITAXIAL GROWTH; IRON COMPOUNDS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MOLECULAR ORIENTATION; PERMITTIVITY; SUBSTRATES; VOLUME FRACTION;

EID: 33745865939     PISSN: 10584587     EISSN: 16078489     Source Type: Conference Proceeding    
DOI: 10.1080/10584580600660496     Document Type: Article
Times cited : (5)

References (12)
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  • 3
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    • Domain configurations due to multiple misfit relaxation mechanisms in epitaxial ferroelectric thin films
    • J. S. Speck and W. Pompe, "Domain Configurations Due to Multiple Misfit Relaxation Mechanisms in Epitaxial Ferroelectric Thin Films," II. Theory. J. Appl. Phys. 76, 466 (1994).
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    • Speck, J.S.1    Pompe, W.2
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    • Domain configurations due to multiple misfit relaxation mechanisms in epitaxial ferroelectric thin films
    • II. Experimental Verification and Implications
    • J. S. Speck, A. Seifen, W. Pompe, and R. Ramesh, "Domain Configurations Due to Multiple Misfit Relaxation Mechanisms in Epitaxial Ferroelectric Thin Films," II. Experimental Verification and Implications. J. Appl. Phys. 76, 477 (1994).
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    • Speck, J.S.1    Seifen, A.2    Pompe, W.3    Ramesh, R.4
  • 11
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    • 3 thin film prepared by source gas pulse-introduced metalorganic chemical vapor deposition
    • 3 Thin Film Prepared by Source Gas Pulse-Introduced Metalorganic Chemical Vapor Deposition," Jpn. J. Appl. Phys. 39, L996 (2000).
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    • Nagashima, K.1    Aratani, M.2    Funakubo, H.3
  • 12
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    • Epitaxial Pt film with different orientation grown on (100)Si substrate by RF magnetron sputtering method
    • S. Okamoto, T. Watanabe, K. Akiyama, S. Kaneko, H. Funakubo, and S. Horita, "Epitaxial Pt Film with Different Orientation Grown on (100)Si Substrate by RF Magnetron Sputtering Method," Jpn. J. Appl. Phys. 44, 5102 (2005).
    • (2005) Jpn. J. Appl. Phys. , vol.44 , pp. 5102
    • Okamoto, S.1    Watanabe, T.2    Akiyama, K.3    Kaneko, S.4    Funakubo, H.5    Horita, S.6


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.