The growth and structure of titanium dioxide films on a Re(1 0 -1 0) surface: Rutile(0 1 1)-(2 × 1)

Surface Science

Volumn 600, Issue 14, 2006, Pages 2830-2840

  Rosenthal, D ^a   Zizak, I ^b   Darowski, N ^b   Magkoev, T T ^c   Christmann, K ^a  

^a FREIE UNIVERSITÄT BERLIN   (Germany)

^b HAHN MEITNER INSTITUT   (Germany)

^c NORTH OSSETIAN STATE UNIVERSITY   (Russian Federation)

Author keywords

Faceting; LEED; LEIS; Rhenium; Thin film growth; Titanium dioxide; XPS; XRD

Indexed keywords

FILM GROWTH; LOW ENERGY ELECTRON DIFFRACTION; OXYGEN; RHENIUM; STOICHIOMETRY; TITANIUM DIOXIDE; VAPOR DEPOSITION; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

FACETING; FILM THICKNESS; LOW-ENERGY ION SCATTERING (LEIS); THIN FILM GROWTH;

METALLIC FILMS;

EID: 33745852758     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2006.04.017     Document Type: Article

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