Ion beam lithography using single ions

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 249, Issue 1-2 SPEC. ISS., 2006, Pages 730-733

  Alves, A ^a   Reichart, P ^b   Siegele, R ^c   Johnston, P N ^a   Jamieson, D N ^b  

^a RMIT UNIVERSITY   (Australia)

^b UNIVERSITY OF MELBOURNE   (Australia)

^c AUSTRALIAN NUCLEAR SCIENCE AND TECHNOLOGY ORGANISATION   (Australia)

Author keywords

High aspect ratio structures; Ion beam lithography; Ion tracks; Latent damage; Nuclear microprobe; Photonic crystals; PMMA; Single ion counting; Track etching

Indexed keywords

ASPECT RATIO; ATOMIC FORCE MICROSCOPY; CRYSTAL WHISKERS; HOLE MOBILITY; PHOTODIODES; SILICON;

HIGH ASPECT RATIO STRUCTURES; ION TRACKS; LATENT DAMAGE; NUCLEAR MICROPROBE; PHOTONIC CRYSTALS; SINGLE ION COUNTING; TRACK ETCHING;

ION BEAM LITHOGRAPHY;

EID: 33745839865     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2006.03.128     Document Type: Article

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