Micromachining by ion track lithography

Sensors and Actuators, A: Physical

Volumn 73, Issue 1-2, 1999, Pages 176-183

  Thornell, Greger ^a   Spohr, Reimar ^b   Van Veldhuizen, Elbert Jan ^a   Hjort, Klas ^a  

^a UPPSALA UNIVERSITY   (Sweden)

^b GSI HELMHOLTZZENTRUM FÜR SCHWERIONENFORSCHUNG GMBH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL MICROSTRUCTURE; ETCHING; LITHOGRAPHY; MASKS; QUARTZ; SINGLE CRYSTALS;

MICROMACHINING BY ION TRACK ETCHING (MITE);

MICROMACHINING;

EID: 0033537533     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(98)00268-4     Document Type: Article

References (7)

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2. Thornell G., Hjort K., Studer B., Schweitz J.-Å. Anisotropy-independent through micromachining of quartz resonators by ion track etching. IEEE Transactions on Ultrasonics Ferroelectrics, and Frequency Control. 4:1997;829-838.
3. R. Spohr, Ion Tracks and Microtechnology: Principles and Applications, Vieweg, Mainz (1990).
4. R.L. Fleischer, P.B. Price, R.M. Walker, Nuclear Tracks in Solids: Principles and Applications, University of California, Berkeley, CA (1975).
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6. Hedlund C., Lindberg U., Bucht U., Söderkvist J. Anisotropic etching of Z-cut quartz. J. Micromech. Microeng. 3:1993;65-73.
7. Trautmann C., Bruechle W., Spohr R., Vetter J., Angert N. Pore geometry of etched ion tracks in polyimide. Nucl. Instr. Meth. Phys. Res. B. 111(1-2):1996;70-74.