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Volumn 249, Issue 1-2 SPEC. ISS., 2006, Pages 843-846
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Ion beam synthesis and characterization of Ge nanoparticles in SiO2
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Author keywords
Ge implantation; GISAXS; Ion beam mixing; Nanocrystals; RBS; XRD
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Indexed keywords
ANNEALING;
EMBEDDED SYSTEMS;
GERMANIUM;
ION BEAMS;
ION IMPLANTATION;
RUTHERFORD BACKSCATTERING SPECTROSCOPY;
SEMICONDUCTOR QUANTUM DOTS;
SILICA;
X RAY DIFFRACTION;
GE IMPLANTATION;
GISAXS;
ION BEAM MIXING;
X-RAY SCATTERING;
NANOSTRUCTURED MATERIALS;
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EID: 33745834779
PISSN: 0168583X
EISSN: None
Source Type: Journal
DOI: 10.1016/j.nimb.2006.03.151 Document Type: Article |
Times cited : (13)
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References (10)
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