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Volumn 249, Issue 1-2 SPEC. ISS., 2006, Pages 843-846

Ion beam synthesis and characterization of Ge nanoparticles in SiO2

Author keywords

Ge implantation; GISAXS; Ion beam mixing; Nanocrystals; RBS; XRD

Indexed keywords

ANNEALING; EMBEDDED SYSTEMS; GERMANIUM; ION BEAMS; ION IMPLANTATION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTOR QUANTUM DOTS; SILICA; X RAY DIFFRACTION;

EID: 33745834779     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2006.03.151     Document Type: Article
Times cited : (13)

References (10)
  • 8
    • 33745816514 scopus 로고    scopus 로고
    • M. Mayer, Technical Report IPP 9/113. Max-Planck Institut fur Plasmaphysik, Garching, Germany, 1997.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.