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Volumn 249, Issue 1-2 SPEC. ISS., 2006, Pages 310-313

Stress and stress relief in dielectric thin films - the role of hydrogen

Author keywords

Crack; ERD; Hydrogen; PECVD; Stress; Thin film

Indexed keywords

ANNEALING; CRACKS; HYDROGEN; OSCILLATIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICA; STRESS RELIEF; STRESSES; SUBSTRATES; TENSILE STRESS; THERMAL EFFECTS; THIN FILMS;

EID: 33745818576     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2006.04.018     Document Type: Article
Times cited : (9)

References (20)
  • 8
    • 33745806719 scopus 로고    scopus 로고
    • J.W. Hutchinson, in: Mater. Res. Soc. Symp. Proc., 1989.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.