Performance data on new tunable attenuating PSM for 193nm and 157nm lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5446, Issue PART 2, 2004, Pages 542-549

  Becker, Hans ^a   Schmidt, Frank ^a   Sobel, Frank ^a   Renno, Markus ^a   Buttgereit, Ute ^a   Chey, Jay ^b   Angelopoulos, Marie ^b   Knapp, Konrad ^a   Hess, Günter ^a  

^a Schott Lithotec AG   (Germany)

^b IBM RESEARCH   (United States)

Author keywords

157nm; 193nm; Mask blank; Phase shift; PSM

Indexed keywords

157NM; 193NM; MASK BLANK; PSM;

ETCHING; LIGHT TRANSMISSION; MASKS; METALLIC FILMS; PHASE SHIFT; SILICON COMPOUNDS; SPECIFICATIONS; SURFACE ROUGHNESS; TANTALUM COMPOUNDS;

LITHOGRAPHY;

EID: 11844304179     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.557798     Document Type: Conference Paper

References (5)

1. P. Rai-Choudhurỳ, Handbook of Microlithography, Micromachining, and Microfabrication, Vol. 1: Microlithography, SPIE, Bellingham, WA, 1997
2. M. D. Levenson, Wavefront engineering for photolithography, Physics Today, pp. 28-36, July, 1993
3. M. D. Levenson, N. S. Viswanathan, R. A. Simpson, Improving resolution in photolithography with a phase-shifting mask, IEEE Trans. on Electron Devices ED-29, pp. 1828-1836, 1982
4. A. Macleod, Thin-film optical filters, Second ed., 1986, Bristol, Adam Hilger
5. The Math Works, Inc., http://www.mathworks.com