OPC to improve lithographic process window

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6156, Issue , 2006, Pages

  Word, James ^a   Sakajiri, Kyohei ^a  

^a MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

DFM; DOF; OPC; Process Window; RET

Indexed keywords

DFM; DOF; OPC; PROCESS WINDOW; RET;

COMPUTER SIMULATION; DISPERSIONS; LITHOGRAPHY; MATHEMATICAL MODELS; PROCESS CONTROL; SENSITIVITY ANALYSIS;

OPTICAL ENGINEERING;

EID: 33745804269     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.655237     Document Type: Conference Paper

References (5)

1. A. Misaka, S. Odanaka, "Optical Proximity Correction Considering Process Latitude", Proc. SPIE Vol. 3679, pp. 448-658, 1999.
2. A. Tritchkov, et. al. "Optical Proximity Effects Correction at 0.25um Incorporating Process Variations in Lithography", SPIE Vol. 3051, pp. 726-738, 1997.
3. N. Cobb, Y. Granik, "Using OPC to optimize for image slope and improve process window", Proc. SPIE Vol. 5042, pp. 116-125, 2003.
4. Ji-Suk Hong, et. al. "New OPC methods to increase process margin for sub-70nm devices", Proc. SPIE Vol. 5756, pp. 302-312, 2005.
5. N. Cobb, A. Zakhor, "A mathematical and CAD framework for proximity correction", Proc. SPIE Vol. 2726, pp. 208 -222, 1996.