Resist process window characterization for the 45-nm node using an interferometric immersion microstepper

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6153 I, Issue , 2006, Pages

  Bourov, Anatoly ^a,c   Robertson, Stewart A ^b   Smith, Bruce W ^c   Slocum, Michael A ^c   Piscani, Emil C ^c  

^a ROCHESTER INSTITUTE OF TECHNOLOGY   (United States)

^b ROHM AND HAAS COMPANY   (United States)

^c Amphibian Systems   (United States)

Author keywords

Bossung; Immersion; Interference; Lithography; Photoresist; Process window

Indexed keywords

COMPUTER SIMULATION; IMAGING TECHNIQUES; INTERFEROMETERS; INTERFEROMETRY; MODULATION; PROCESS CONTROL;

BOSSUNG; IMMERSION; INTERFERENCE; PROCESS WINDOW;

PHOTORESISTS;

EID: 33745625392     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.657578     Document Type: Conference Paper

References (7)

1. W. Hinsberg, F. A. Houle, J. Hoffnagle, M. Sanchez, G. Wallraff, M. Morrison, and S. Frank, "Deep-ultraviolet interferometric lithography as a tool for assessment of chemically amplified photoresist performance", J. Vac. Sci. Technol. B 16(6) 3689
2. J. A. Hoffnagle, W. D. Hinsberg, M. Sanchez, and F. A. Houle, "Liquid immersion deep-ultraviolet interferometric lithography", J. Vac. Sci. Technol. B 17(6) 3306
3. A. Bourov, Y. Fan, F. C. Cropanese, N. V. Lafferty, L. Zavyalova, H. Kang, B. W. Smith, "Immersion microlithography at 193nm with a Talbot prism interferometer", Proc SPIE 5377 (2004) 1573
4. J. A. Hoffnagle, W. D. Hinsberg, F. A. Houle, and M. I. Sanchez, "Characterization of photoresist spatial resolution by interferometric lithography", Proc SPIE 5038 (2003) 464
5. F. Cropanese, A. Bourov, Y. Fan, A. Estroff, L. Zavyalova, B.W. Smith, "Synthesis of projection lithography for low kl via interferometry", Proc. SPIE 5377, (2004)
6. PROLITH v.9.2, KLA-Tencor, Austin, TX, USA
7. B. W. Smith, A. Bourov, Y. Fan, F. Cropanese, P. Hammond, "Amphibian XIS: An Immersion Lithography Microstepper Platform", Proc. SPIE 5754, (2005)