Defectivity reduction by optimization of 193-nm immersion lithography using an interfaced exposure - Track system

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6153 II, Issue , 2006, Pages

  Carcasi, Michael ^c   Hatakeyama, Shinichi ^a   Nafus, Kathleen ^a   Moerman, Richard ^b   Van Dommelen, Youri ^b   Huisman, Peter ^b   Hooge, Joshua ^c   Scheer, Steven ^c   Foubert, Philippe ^d  

^a TOKYO ELECTRON LTD   (Japan)

^b ASML   (Netherlands)

^c TOKYO ELECTRON AMERICA INC   (United States)

^d IMEC   (Belgium)

Author keywords

Bridge; Immersion; Post rinse; Pre rinse; Swelling; Topcoat; Watermark

Indexed keywords

IMMERSION; POST-RINSE; PRE-RINSE; TOPCOAT;

BRIDGES; INTERFACES (MATERIALS); OPTIMIZATION; PROJECTION SYSTEMS; SILICON WAFERS; SWELLING; THIN FILMS; WATERMARKING;

LITHOGRAPHY;

EID: 33745634889     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656444     Document Type: Conference Paper

References (3)

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3. D. Kawamura, T. Takeishi, K Sho, K. Matsunaga, N. Shibata, K Ozawa, S. Shimura, H. Kyoda, T. Kawasaki, S. Ishida, T. Toshima, Y. Oonishi, S. Ito, Proc. SPIE 5753, 818 (2005)