Study of Proximity Lithography Simulations Using Actual Measurements of Dissolution Rates in Thick Resist Films

IEEJ Transactions on Fundamentals and Materials

Volumn 124, Issue 3, 2004, Pages 286-292

  Sensu, Yoshihisa ^a   Isono, Mariko ^a   Sekiguchi, Atsushi ^a   Kadoi, Mikio ^a   Matsuzawa, Toshiharu ^a   Minami, Youichi ^a  

^a Jpn   (Japan)

Author keywords

dissolution rate; mask aligner; proximity lithography; resist pattern simulation; thick film resist

Indexed keywords

EID: 22144495491     PISSN: 03854205     EISSN: 13475533     Source Type: Journal    
DOI: 10.1541/ieejfms.124.286     Document Type: Article

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