Investigation of a novel dis charge EUV source for microlithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6151 II, Issue , 2006, Pages

  Bauer, Bruno S ^a   Makhin, Volodymyr ^a   Fuelling, Stephan ^a   Lindemuth, Irvin R ^a  

^a UNIVERSITY OF NEVADA   (United States)

Author keywords

EUV source; Magnetic mirror; MHD; Plasma discharge; Radiation; Radio frequency; Simulation

Indexed keywords

LITHOGRAPHY; MAGNETOHYDRODYNAMICS; MIRRORS; OSCILLATORS (ELECTRONIC); PLASMAS; SPECTROSCOPIC ANALYSIS;

EUV SOURCE; MAGNETIC MIRRORS; MHD; PLASMA DISCHARGES; RADIO FREQUENCY;

ULTRAVIOLET RADIATION;

EID: 33745628740     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656817     Document Type: Conference Paper

References (9)

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8. V. Makhin, B.S. Bauer, I.R. Lindemuth, and B.J. Rice, 'Development of laser deposition package for modeling of EUV sources for microlithography,' Emerging Lithographic Technologies IX, Proc. SPIE 5751, 840-851 (2005).
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