Spin-on hard mask with dual BARC property for 50 nm devices

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6153 I, Issue , 2006, Pages

  Hah, Jung Hwan ^a   Chae, Yun Sook ^a   Jang, Yun Kyeong ^a   Ryoo, Manhyoung ^a   Choi, Sang Jun ^a   Woo, Sang Gyun ^a   Cho, Han Ku ^a   Moon, Joo Tae ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

ArF; Dual BARC; Hard mask; Immersion; Spin on

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COATINGS; LITHOGRAPHY; NANOSTRUCTURED MATERIALS; PROBLEM SOLVING; SUBSTRATES;

ARF; DUAL BARC; HARD MASK; IMMERSION; SPIN-ON;

MASKS;

EID: 33745597650     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656075     Document Type: Conference Paper

References (4)

1. W. Liu et al., SPIE 5040, 841 (2003).
2. D. J. Abdalah et al., SPIE 5753,417 (2005).
3. K. Babich et al., SPIE 5039, 152 (2003).
4. T. Shibata et al., SPIE 4690, 773 (2002).