Ferroelectric behavior in nominally relaxor lead lanthanum zirconate titanate thin films prepared by chemical solution deposition on copper foil

Applied Physics Letters

Volumn 88, Issue 26, 2006, Pages

  Kim, Taeyun ^b   Hanson, Jacqueline N ^b   Gruverman, Alexei ^b   Kingon, Angus I ^b   Streiffer, S K ^a  

^a ARGONNE NATIONAL LABORATORY   (United States)

^b NONE

Author keywords

[No Author keywords available]

Indexed keywords

CURIE TEMPERATURE; FERROELECTRIC DOMAIN; HIGH TEMPERATURE CRYSTALLIZATION; OUT-OF-PLANE POLARIZATION;

COMPOSITION EFFECTS; COPPER; DEPOSITION; FERROELECTRICITY; HYSTERESIS; SEMICONDUCTING LEAD COMPOUNDS; THERMAL EXPANSION;

THIN FILMS;

EID: 33745589308     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2217254     Document Type: Article

References (18)

1. H. N. Al-Shareef, O. Auciello, and A. I. Kingon, J. Appl. Phys. 77, 2146 (1995).
2. S. Trolier-McKinstry and P. Murait, J. Electroceram. 12, 7 (2004).
3. R. E. Jones, Jr., P. D. Maniar, J. O. Olowolafe, A. C. Campbell, and C. J. Mogab, Appl. Phys. Lett. 60, 1022 (1992).
4. T. Toshihiko and D. A. Payne, J. Am. Ceram. Soc. 77, 1242 (1994).
5. G. H. Haertling and C. E. Land, J. Am. Ceram. Soc. 54, 1 (1971).
6. D. Dimos, W. L. Warren, M. B. Sinclair, B. A. Turtle, and R. W. Schwartz, J. Appl. Phys. 76, 4305 (1994).
7. A. I. Kingon and S. Srinivasan, Nat. Mater. 4, 233 (2005).
8. M. D. Losego, L. H. Jimison, J. F. Ihlefeld, and J.-P. Maria, Appl. Phys. Lett. 86, 172906 (2005).
9. G. H. Haertling, Ferraelectrics 75, 25 (1987).
10. A. K. Tagantsev, N. A. Pertsev, P. Murait, and N. Setter, Phys. Rev. B 65, 012104 (2001).
11. N. A. Pertsev, A. G. Zembilgotov, S. Hoffmann, R. Waser, and A. K. Tagantsev, J. Appl. Phys. 85, 1698 (1999).
12. D. R. Lide, CRC Handbook of Chemistry and Physics, 86th ed. (CRC, Boca Raton, FL, 2005).
13. M. Yokosuka and M. Marutake, Jpn. J. Appl. Phys., Part 1 25, 981 (1986).
14. M. J. Haun, Z. Q. Zhuang, E. Furman, S. J. Jang, and L. E. Cross, Ferroelectrics 99, 45 (1989).
15. S. K. Streiffer, C. B. Basceri, C. B. Parker, Se. E. Lash, and A. I. Kingon, J. Appl. Phys. 86, 4565 (1999).
16. N. A. Pertsev, V. G. Kukhar, H. Kohlstedt, and R. Waser, Phys. Rev. B 67, 054107 (2003).
17. G. H. Haertling, Integr. Ferroelectr. 3, 207 (1993).
18. J. F. Ihlefeld, J.-P. Maria, and W. Borland, J. Mater. Res. 20, 2838 (2005).