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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 24, Issue 4, 2006, Pages 1652-1654

Interface stability between amorphous ferromagnetic layer and Al oxide barrier in tunneling magnetoresistive films at elevated temperatures

(5) Peng, Xilin a Kvitek, Dick a Morone, Augusto a Axdal, Steven H a Xue, Song a

a SEAGATE TECHNOLOGY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INTERFACE STABILITY; JUNCTION DEVICES; LOOPS; MAGNETIC TUNNELING;

ALUMINUM COMPOUNDS; AMORPHOUS MATERIALS; ANNEALING; DIFFUSION; FERROMAGNETIC MATERIALS; HYSTERESIS; MAGNETORESISTANCE; MICROSTRUCTURE; PHYSICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

INTERFACES (MATERIALS);

EID: 33745492779 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.2198860 Document Type: Article

Times cited : (1)

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