Characteristics of large-diameter plasma using a radial-line slot antenna

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 24, Issue 4, 2006, Pages 1421-1424

  Tian, C ^a   Nozawa, T ^a   Ishibasi, K ^a   Kameyama, H ^a   Morimoto, T ^a  

^a TOKYO ELECTRON LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELECTRONS; ETCHING; PLASMA PROBES; PRESSURE EFFECTS; SURFACE WAVES; TEMPERATURE DISTRIBUTION;

ELECTRON TEMPERATURE; PLASMA GENERATION; PLASMA SURFACE; SURFACE-WAVE PLASMA;

SLOT ANTENNAS;

EID: 33745488410     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2167983     Document Type: Article

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