Characterizing process semiconductor thin films with a confocal micro X-ray fluorescence microscope

Powder Diffraction

Volumn 21, Issue 2, 2006, Pages 145-147

  Sparks, Chris M ^a   Hastings, Elizabeth P ^b   Havrilla, George J ^b   Beckstead, Michael ^b  

^a ATDF   (United States)

^b LOS ALAMOS NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HAFNIUM SILICATES; HIGH- K GATE DIELECTRICS; MICRO X-RAY FLUORESCENCE; NON DESTRUCTIVE; SEMI-CONDUCTOR WAFER; SEMICONDUCTOR THIN FILMS; TITANIUM NITRIDE FILMS;

FILM GROWTH;

THIN FILMS;

EID: 33745481497     PISSN: 08857156     EISSN: 19457413     Source Type: Journal    
DOI: 10.1154/1.2204069     Document Type: Conference Paper

References (6)

1. Choi, K., Lysaght, P., Alshareef, H., Huffman, C., Wen, H.-C., Harris, R., Luan, H., Hung, P.-Y., Sparks, C., Cruz, M., Matthews, K., Majhi, P., and Lee, B. H. (2005). Thin Solid Films 486, 141-144.
2. Ding, X., Gao, N., and Havrilla, G. (2000). Proc. SPIE 4144, 174-182.
3. Havrilla, G. J. and Miller, T. (2004). Powder Diffr. 19, 119-126.
4. Singer, P. (2003). Semicond. Int., 0163-3767 July issue, p. 46.
5. Sparks, C. M., Lysaght, P., and Rhoad, T. (2005). Powder Diffr. 20, 161-164.
6. Zeitzoff, P., Murto, R., and Huff, H. (2002). Solid State Technol. 45, 71-76.