Interstitial OH radicals in F2-laser-irradiated bulk amorphous SiO2

Journal of Physical Chemistry B

Volumn 110, Issue 21, 2006, Pages 10224-10227

  Kajihara, Koichi ^a   Hirano, Masahiro ^a   Skuja, Linards ^b   Hosono, Hideo ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b UNIVERSITY OF LATVIA   (Latvia)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; ANNEALING; ATOMIC PHYSICS; LASER BEAMS; MOLECULAR DYNAMICS; PARAMAGNETIC RESONANCE; SILICON COMPOUNDS;

AMORPHOUS ICE; HYDROGEN ATOMS; HYDROXYL RADICALS; THERMAL ANNEALING;

SILICA;

EID: 33745473772     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp061370y     Document Type: Article

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