Copper electrodeposition localized in picoliter droplets using microcantilever arrays

Applied Physics Letters

Volumn 88, Issue 25, 2006, Pages

  Leichle T ^a   Nicu, L ^a   Descamps, E ^b   Corso, B ^b   Mailley, P ^b   Livache, T ^b   Bergaud, C ^c  

^a LAAS CNRS   (France)

^b CEA GRENOBLE   (France)

^c INSTITUTE OF INDUSTRIAL SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARRAYS; CANTILEVER BEAMS; COPPER COMPOUNDS; ELECTRIC POTENTIAL; ELECTROCHEMISTRY; ELECTRODES; GOLD; SILICON COMPOUNDS;

ELECTROCHEMICAL REACTIONS; MICROCANTILEVER ARRAYS; MICROFABRICATED ARRAY; PICOLITER DROPLETS;

ELECTRODEPOSITION;

EID: 33745443252     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2214181     Document Type: Article

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