Structural and optical properties of Bax Sr1-x TiO3 thin films on indium tin oxide/quartz substrates prepared by radio-frequency magnetron sputtering

Journal of Applied Physics

Volumn 99, Issue 11, 2006, Pages

  Leng, W J ^a   Yang, C R ^a   Zhang, J H ^a   Chen, H W ^a   Ji, H ^a   Fu, C L ^a   Liao, J X ^a  

^a UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTALLIZATION; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; OPTICAL WAVEGUIDES; OXIDES; QUARTZ APPLICATIONS; STRONTIUM COMPOUNDS; TITANIUM COMPOUNDS;

DIELECTRIC FUNCTION MODELS; INDIUM-DOPED TIN OXIDE (ITO); PEROVSKITE STRUCTURES; QUARTZ SUBSTRATES;

BARIUM COMPOUNDS;

EID: 33745262375     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2202094     Document Type: Article

References (27)

1. X. Yuhuan, Ferroelectric Materials and Their Applications (Elsevier, Amsterdam, 1991), pp. 101-159.
2. K. Abe and S. Komatsu, Jpn. J. Appl. Phys., Part 1 33, 5297 (1994).
3. B. Hoerman, G. M. Ford, L. D. Kaufmann, and B. Wessels, Appl. Phys. Lett. 73, 2248 (1998).
4. N. Baskaran, A. Ghule, C. Bhongale, R. Murugan, and H. Chang, J. Appl. Phys. 91, 10038 (2002).
5. K. Kato, K. Suzuki, W. H. Kasner, and M. H. Francombe, Appl. Phys. Lett. 78, 1119 (2001).
6. J. F. Scott and C. A. Paz de Araujo, Science 246, 1400 (1989).
7. H. Tian, J. Choi, K. No, W. Luo, and A. Ding, Mater. Chem. Phys. 78, 138 (2002).
8. D. Y. Wang, C. L. Mak, K. H. Wong, H. L. W. Chan, and C. L. Choy, Ceram. Int. 30, 1745 (2004).
9. F. M. Pontes, E. R. Leite, D. S. L. Pontes, and E. Longo, J. Appl. Phys. 91, 5972 (2002).
10. Y. W. Li, J. L. Sun, X. J. Meng, J. H. Chu, and W. F. Zhang, Appl. Phys. Lett. 85, 1964 (2004).
11. D. Y. Kim, S. E. Moon, E. K. Kim, S. J. Lee, J. J. Choi, and H. E. Kim, Appl. Phys. Lett. 82, 1455 (2003).
12. D. H. Kim and H. S. Kwok, Appl. Phys. Lett. 67, 1803 (1995).
13. S. Witanachi, S. Patel, D. T. Shaw, and H. S. Kwok, Appl. Phys. Lett. 55, 295 (1989).
14. S. Miura, T. Yoshitake, Y. Miyasaka, and N. Shohata, Appl. Phys. Lett. 53, 1967 (1988).
15. X. D. Wu, Appl. Phys. Lett. 54, 754 (1989).
16. C. L. Fu, Mater. Lett. 59, 330 (2005).
17. H. W. Chen, Mater. Sci. Eng., B 121, 98 (2005).
18. S. Y. Kuo, W. Y. Liao, and W. F. Hsieh, Phys. Rev. B 64, 224103 (2001).
19. D. K. Fork, F. Armani-Leplingard, J. J. Kingston, and G. B. Anderson, in Thin Film for Integrated Optics Applications, edited by, B. W. Wessels, S. R. Marder, and, D. M. Walba, (Materials Research Society, Pittsburgh, 1995), p. 189.
20. J. C. Tauc, Amorphous and Liquid Semiconductor (Plenum, New York, 1974), p. 159.
21. B. Panda, A. Dhar, G. D. Nigam, D. Bhattacharya, and S. K. Ray, Thin Solid Films 332, 46 (1998).
22. Y. P. Wang and T. Y. Tseng, J. Mater. Sci. 34, 4573 (1999).
23. F. Tcheliebou, H. S. Ryu, C. K. Hong, W. S. Park, and S. Baik, Thin Solid Films 299, 14 (1997).
24. K. Zanio, Semiconductors and Semimetals (Academic, New York, 1978), Vol. 13.
25. R. K. Willardson and A. C. Beer, Semiconductors and Semimetals (Academic, New York, 1981), Vol. 18.
26. M. N. Kamalasanan, S. Chandra, P. C. Joshi, and A. Mansingh, Appl. Phys. Lett. 59, 3547 (1991).
27. S. Adachi, Phys. Rev. B 35, 7454 (1987).