Ferroelectric properties of alkoxy-derived CaBi4Ti4O15 thin films on Pt-passivated Si

Applied Physics Letters

Volumn 78, Issue 8, 2001, Pages 1119-1121

  Kato, Kazumi ^a,b   Suzuki, Kazuyuki ^b   Nishizawa, Kaori ^b   Miki, Takeshi ^b  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001124795     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1349871     Document Type: Article

References (10)

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