Patterning in rapidly evaporated polymer solutions: Formation of annular structures under evaporation of the poor solvent

Journal of Colloid and Interface Science

Volumn 300, Issue 1, 2006, Pages 293-297

  Bormashenko, Edward ^a   Pogreb, Roman ^a   Musin, Albina ^a   Stanevsky, Oleg ^a   Bormashenko, Yelena ^a   Whyman, Gene ^a   Barkay, Zahava ^b  

^a ARIEL UNIVERSITY   (Israel)

^b TEL AVIV UNIVERSITY   (Israel)

Author keywords

Annular structures; Patterning; Polymer solutions; Poor solvent; Viscous dewetting

Indexed keywords

ATOMIC FORCE MICROSCOPY; EVAPORATION; SCANNING ELECTRON MICROSCOPY; SOLUTIONS; SOLVENTS;

ANNULAR STRUCTURES; PATTERNING; POLYMER SOLUTIONS; POOR SOLVENT; VISCOUS DEWETTING;

POLYSTYRENES;

ACETONE; CHLOROFORM; POLYMER; POLYSTYRENE; SOLVENT;

AQUEOUS SOLUTION; ARTICLE; ATOMIC FORCE MICROSCOPY; EVAPORATION; PRIORITY JOURNAL; SCANNING ELECTRON MICROSCOPY; STRUCTURE ANALYSIS; THEORETICAL STUDY; VISCOSITY;

EID: 33745224333     PISSN: 00219797     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcis.2006.03.064     Document Type: Article

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