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Materials Letters

Volumn 59, Issue 19-20, 2005, Pages 2461-2464

Mesoscopic and submicroscopic patterning in thin polymer films: Impact of the solvent

(10) Bormashenko, Edward a Pogreb, Roman a Stanevsky, Oleg a Bormashenko, Yelena a Tamir, Stein a Cohen, Ron a Nunberg, Meirav a Gaisin, Vladimir Zeev a Gorelik, Maria a Gendelman, O V b

a ARIEL UNIVERSITY (Israel)

b TECHNION ISRAEL INSTITUTE OF TECHNOLOGY (Israel)

Author keywords

Mesoscopic; Microstructure; Polymers; Pores; Self assembling; Solvent

Indexed keywords

COATING TECHNIQUES; MICROSTRUCTURE; POLYCARBONATES; POLYMERS; POLYSTYRENES; POROSITY; SELF ASSEMBLY; SOLVENTS; THIN FILMS;

MESOSCOPIC; PORES; SELF ORGANIZATION; SELF-ASSEMBLING;

PLASTIC FILMS;

EID: 20444488121 PISSN: 0167577X EISSN: None Source Type: Journal
DOI: 10.1016/j.matlet.2005.03.015 Document Type: Article

Times cited : (55)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.