A method of determining the charge trapped at the interfaces of a metal/ferroelectric/metal thin-film structure

Physics of the Solid State

Volumn 48, Issue 6, 2006, Pages 1182-1185

  Delimova, L ^a   Grekhov, I ^a   Mashovets, D ^a   Shin, S ^b   Koo, J M ^b   Kim, S P ^b   Park, Y ^b  

^a IOFFE INSTITUTE   (Russian Federation)

^b Samsung Advanced Institute of Technology (SAIT)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33745212242     PISSN: 10637834     EISSN: None     Source Type: Journal    
DOI: 10.1134/S1063783406060527     Document Type: Article

References (21)

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