Compact UHV system for fabrication and in situ analysis of electron beam deposited structures using a focused low energy electron beam

Review of Scientific Instruments

Volumn 77, Issue 5, 2006, Pages

  Kakefuda, Y ^a   Yamashita, Y ^a   Mukai, K ^a   Yoshinobu, J ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; DEPOSITION; ELECTRON BEAMS; ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRONIC STRUCTURE; ELECTROSTATIC LENSES; LOW ENERGY ELECTRON DIFFRACTION; NANOSTRUCTURED MATERIALS; SCANNING ELECTRON MICROSCOPY; SCINTILLATION;

CYLINDRICAL MIRROR; ELECTRON BEAM DEPOSITION; ELECTRON GUN; IRON PENTACARBONYL [FE (CO)5];

UHV POWER TRANSMISSION;

EID: 33744789407     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2198810     Document Type: Article

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