Using the photolysis of chemically modified gel films preparing ITO fine patterned thin films

IEEE/OSA Journal of Display Technology

Volumn 2, Issue 2, 2006, Pages 175-178

  Li, Ying ^a   Zhao, Gaoyang ^a   Zhang, Weihua ^a   Chen, Yuanqing ^a  

^a XI'AN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Conducting films; Fine patterning; Photosensitivity; Sol gel

Indexed keywords

CONDUCTIVE FILMS; DOPING (ADDITIVES); ETCHING; IRRADIATION; PHOTOLYSIS; PHOTOSENSITIVITY; SOL-GELS; THIN FILMS; TIN;

FINE PATTERNED THIN FILMS; FINE PATTERNING; GEL FILMS; SOL-GEL TECHNOLOGY;

INDIUM COMPOUNDS;

EID: 33744745601     PISSN: 1551319X     EISSN: None     Source Type: Journal    
DOI: 10.1109/JDT.2006.871400     Document Type: Article

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