Effects of sensitizers on the photosensitivity of chemically modified Al2O3 gel films

Journal of the Ceramic Society of Japan

Volumn 106, Issue 2, 1998, Pages 183-188

  Zhao, Gaoyang ^a   Tohge, Noboru ^a  

^a KINKI UNIVERSITY   (Japan)

Author keywords

Chemical modification; Patterning; Photolysis; Sensitizer

Indexed keywords

CHEMICAL MODIFICATION; DENSIFICATION; DISSOCIATION; EXCIMER LASERS; FILMS; GELS; LASER BEAM EFFECTS; ORGANIC COMPOUNDS; PHASE TRANSITIONS; PHOTOLYSIS; PHOTOSENSITIVITY; ULTRAVIOLET RADIATION;

ACETOPHENONE; BENZOPHENONE; BENZOYLACETONE; GEL FILM; PATTERNING; SENSITIZER;

ALUMINA;

EID: 0032003610     PISSN: 09145400     EISSN: None     Source Type: Journal    
DOI: 10.2109/jcersj.106.183     Document Type: Article

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