Advanced FinFET technology: TiN metal-gate CMOS and 3T/4T device integration

Proceedings - IEEE International SOI Conference

Volumn 2005, Issue , 2005, Pages 219-220

  Liu, Y X ^a   Endo, K ^a   Masahara, M ^a   Sugimata, E ^a   Matsukawa, T ^a   Ishii, K ^a   Yamauchi, H ^a   Shimizu, T ^a   Sakamoto, K ^a   O'uchi, S ^a   Sekigawa, T ^a   Suzuki, E ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33744741284     PISSN: 1078621X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/SOI.2005.1563594     Document Type: Conference Paper

References (9)

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9. Liu et al., IEEE Silicon Nanoelectronics Workshop, 22 (2005).