Analysis of instability line width and white wall created by the photolithography process

Microelectronics Journal

Volumn 35, Issue 11, 2004, Pages 915-922

  Kuo, Yang Kuao ^a   Chao, Chuen Guang ^a   Lin, Chi Yuan ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

Line width; White wall

Indexed keywords

ABSORPTION; CATALYSIS; FUSED SILICA; MERCURY VAPOR RECTIFIERS; NON NEWTONIAN FLOW; PHOTORESISTS; SCANNING ELECTRON MICROSCOPY; SILICA; SURFACE PHENOMENA;

DEEP ULTRAVIOLET (DUV); LINE WIDTH; PHOTO ACTIVE COMPONENT (PAC); WHITE WALL;

PHOTOLITHOGRAPHY;

EID: 4644243654     PISSN: 00262692     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mejo.2004.06.023     Document Type: Article

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