Nano-fabrication of organosilane self-assembled monolayers: Effects of proximity gap and irradiation time on photoreactivity and lamination

Measurement Science and Technology

Volumn 17, Issue 6, 2006, Pages 1247-1253

  Furukawa, Takeshi ^a   Takai, Osamu ^b  

^a TOHOKU UNIVERSITY   (Japan)

^b NAGOYA UNIVERSITY   (Japan)

Author keywords

Nano fabrication; Oxidized products; Photolithography; Self assembled monolayer; Surface reaction

Indexed keywords

MONOLAYERS; PHOTOCHEMICAL REACTIONS; PHOTODEGRADATION; PHOTOLITHOGRAPHY; SELF ASSEMBLY; SILANES; SUBSTRATES; ULTRAVIOLET RADIATION; X RAY PHOTOELECTRON SPECTROSCOPY;

ACTIVATED OXYGEN ATMOSPHERE; OXIDIZED PRODUCTS; SURFACE REACTION;

NANOTECHNOLOGY;

MONOLAYERS; NANOTECHNOLOGY; PHOTOCHEMICAL REACTIONS; PHOTODEGRADATION; PHOTOLITHOGRAPHY; SELF ASSEMBLY; SILANES; SUBSTRATES; ULTRAVIOLET RADIATION; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 33646869255     PISSN: 09570233     EISSN: 13616501     Source Type: Journal    
DOI: 10.1088/0957-0233/17/6/S03     Document Type: Conference Paper

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