Desorption of H from Si(111) by resonant excitation of the Si-H vibrational stretch mode

Science

Volumn 312, Issue 5776, 2006, Pages 1024-1026

  Liu, Zhiheng ^a,b   Feldman, L C ^b,c   Tolk, N H ^b   Zhang, Zhenyu ^c,d   Cohen, P I ^a  

^a University of Minnesota   (United States)

^b VANDERBILT UNIVERSITY   (United States)

^c OAK RIDGE NATIONAL LABORATORY   (United States)

^d UNIVERSITY OF TENNESSEE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DESORPTION; INFRARED RADIATION; ISOTOPES; RESONANCE; SILICON COMPOUNDS; THERMAL EFFECTS; VIBRATION CONTROL;

ENERGY THERMALIZATION; INFRARED INTENSITY; THERMAL DESORPTION MECHANISMS; WAVELENGTH DEPENDENCE;

HYDROGEN;

HYDROGEN; SILICON DIOXIDE;

DESORPTION; HYDROGEN; INFRARED RADIATION; SILICON;

ARTICLE; DESORPTION; ELECTRONICS; ENERGY; INFRARED RADIATION; POLARIZATION; PRIORITY JOURNAL; VIBRATION;

EID: 33646722264     PISSN: 00368075     EISSN: 10959203     Source Type: Journal    
DOI: 10.1126/science.1124529     Document Type: Article

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24. We thank B. N. J. Persson, J. C. Tully, M. M. Albert, B. Wu, J. Rozen, and S. Meng for helpful discussions and J. Kozub, B. Gabella, and the personnel of the Vanderbilt University FEL Center for providing technical support. This work is funded by Defense Advanced Research Projects Agency grant N66001-04-1-8924; U.S. Department of Energy (DOE) grant ER45781; NSF grant DMR-0306239; and in part by the Laboratory-Directed Research and Development Program of Oak Ridge National Laboratory, managed by UT-Battelle for DOE under grant DE-AC05-00OR22725.