Ti1-xCoxO2-δ AlOxFe 0.1Co0.9 magnetic tunnel junctions with varied AlO x thickness

Journal of Applied Physics

Volumn 99, Issue 8, 2006, Pages

  Toyosaki, H ^a   Fukumura, T ^a   Ueno, K ^a   Nakano, M ^a   Kawasaki, M ^a,b  

^a TOHOKU UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC POTENTIAL; FERROMAGNETIC MATERIALS; MAGNETIC PROPERTIES; MAGNETORESISTANCE; MOLECULAR BEAM EPITAXY; SEMICONDUCTING ALUMINUM COMPOUNDS;

FERROMAGNETIC SEMICONDUCTOR; JUNCTION RESISTANCE; MAGNETIC TUNNEL JUNCTIONS;

TUNNEL JUNCTIONS;

EID: 33646720454     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2163829     Document Type: Article

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