SCOPUS 정보 검색 플랫폼

Volumn 15, Issue 1, 2006, Pages 32-33

Electrodeposition: A technology for the future

Author keywords

[No Author keywords available]

Indexed keywords

COATINGS; ELECTROCHEMISTRY; ELECTRONS; METAL ANALYSIS;

ATOMIC LEVEL; ELECTROCHEMICAL DEPOSITION;

ELECTRODEPOSITION;

EID: 33646684999 PISSN: 10648208 EISSN: None Source Type: Journal
DOI: None Document Type: Review

Times cited : (68)

References (5)

1
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- Osaka, T.¹ Homma, T.²

2
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- D. M. Kolb and M. A. Schneeweiss, Electrochem. Soc. Interface, 8(1), 26 (1999).
- (1999) Electrochem. Soc. Interface , vol.8 , Issue.1 , pp. 26
- Kolb, D.M.¹ Schneeweiss, M.A.²

3
- 0033097801
- P. C. Andricacos, Electrochem. Soc. Interface, 8(1), 32 (1999).
- (1999) Electrochem. Soc. Interface , vol.8 , Issue.1 , pp. 32
- Andricacos, P.C.¹

4
- 0033097655
- W. Schwarzacher, Electrochem. Soc. Interface, 8(1), 20 (1999).
- (1999) Electrochem. Soc. Interface , vol.8 , Issue.1 , pp. 20
- Schwarzacher, W.¹

5
- 12344271001
- P. N. Bartlett, Electrochem. Soc. Interface, 13(4), 28 (2004).
- (2004) Electrochem. Soc. Interface , vol.13 , Issue.4 , pp. 28
- Bartlett, P.N.¹

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.