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International Journal of Photoenergy

Volumn 3, Issue 4, 2002, Pages 213-216

Photoexcitation in thin films deposited on silicon substrates by reactive pulsed laser ablation

(4) Giardini Guidoni, A a,b Marotta, V a Orlando, S a Parisi, G P a

a CNR (Italy)

b SAPIENZA UNIVERSITY OF ROME (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

FILM PREPARATION; INDIUM COMPOUNDS; MASS SPECTROMETRY; METAL SUBSTRATES; MULTILAYERS; NITRIDES; OXIDE FILMS; OXYGEN; PULSED LASER DEPOSITION; PULSED LASERS; REACTION INTERMEDIATES; SILICON; TIN OXIDES;

LASER VAPORIZED METAL; NITRIDE SEMICONDUCTORS; NITRIDE SUPERCONDUCTOR; PHOTO-EXCITATIONS; PHOTOABLATION; PULSED LASER ABLATION; PURE ELEMENTS; REACTIVE ATMOSPHERES; SILICON SUBSTRATES; THIN-FILMS;

LASER ABLATION;

EID: 33646596491 PISSN: 1110662X EISSN: 1110662X Source Type: Journal
DOI: 10.1155/s1110662x01000289 Document Type: Article

Times cited : (4)

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