Fabrication of lithographically defined optical coupling facets for silicon-on-insulator waveguides by inductively coupled plasma etching

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 24, Issue 3, 2006, Pages 812-816

  Yap, K P ^a   Lamontagne, B ^b   Delage A ^b   Janz, S ^b   Bogdanov, A ^b   Picard, M ^b   Post, E ^b   Chow Chong, P ^b   Malloy, M ^b   Roth, D ^b   Marshall, P ^b   Liu, K Y ^b   Syrett, B ^a  

^a CARLETON UNIVERSITY   (Canada)

^b NATIONAL RESEARCH COUNCIL CANADA   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

INDUCTIVELY COUPLED PLASMA; INTEGRATED CIRCUITS; LITHOGRAPHY; OPTICAL DEVICES; PLASMA ETCHING; SCANNING ELECTRON MICROSCOPY; SILICON ON INSULATOR TECHNOLOGY;

FACET FABRICATION; PHOTONIC INTEGRATED CIRCUIT; THERMALLY EVAPORATED;

OPTICAL WAVEGUIDES;

EID: 33646594741     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2186657     Document Type: Article

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