메뉴 건너뛰기




Volumn 483-485, Issue , 2005, Pages 331-334

Intensity ratio of the doublet signature of excitons bound to 3C-SiC stacking faults in a 4H-SiC matrix

Author keywords

3c stacking faults; 4H SiC; Quantum wells thickness

Indexed keywords

ELECTRON TRAPS; EXCITONS; HOLE TRAPS; SEMICONDUCTOR QUANTUM WELLS; SILICON CARBIDE;

EID: 33646591009     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/0-87849-963-6.331     Document Type: Conference Paper
Times cited : (11)

References (12)
  • 1
    • 35148818809 scopus 로고    scopus 로고
    • F. Bechstedt, J. Furthmuller, U. Grossner and C. Raffy, in Silicon Carbide : recent major advances, edited by W.J. Choyke, H. Matsunami, G. Pensl, Spingerp.3 (2004).
    • F. Bechstedt, J. Furthmuller, U. Grossner and C. Raffy, in "Silicon Carbide : recent major advances", edited by W.J. Choyke, H. Matsunami, G. Pensl, Spingerp.3 (2004).
  • 4
    • 85086637814 scopus 로고    scopus 로고
    • S. Bai, G. Wagner, E. Shishkin, W.J. Choyke, R.P. Devaty, M. Zhang, P. Pirouz and T. Kimoto, Materials Sei. Forum 389-393, 589 (2002).
    • S. Bai, G. Wagner, E. Shishkin, W.J. Choyke, R.P. Devaty, M. Zhang, P. Pirouz and T. Kimoto, Materials Sei. Forum 389-393, 589 (2002).


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.