Correlation between electrochemical reactivity and surface chemistry of amorphous carbon nitride films

Surface and Interface Analysis

Volumn 38, Issue 4, 2006, Pages 719-722

  Cachet, H ^a   Debiemme Chouvy, C ^a   Deslouis, C ^a   Lagrini, A ^a   Vivier, V ^a  

^a SORBONNE UNIVERSITÉ   (France)

Author keywords

Amorphous carbon nitride; DLC; Electrochemical reactivity; SECM; XPS

Indexed keywords

AMORPHOUS FILMS; ATOMIC FORCE MICROSCOPY; CHEMICAL BONDS; CHEMICAL REACTIONS; CORRELATION METHODS; ELECTROCHEMISTRY; MAGNETRON SPUTTERING; RADIOFREQUENCY SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SURFACE CHEMISTRY; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS CARBON NITRIDE; DLC; ELECTROCHEMICAL REACTIVITY; SCANNING ELECTROCHEMICAL MICROSCOPY (SECM);

CARBON NITRIDE;

EID: 33646579165     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.2146     Document Type: Conference Paper

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