SiC x-ray lithography mask fabricated by electron cyclotron resonance plasma source coupled with divided microwaves

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 3, 1997, Pages 736-740

  Shimada, Masaru ^a,b   Ono, Toshiro ^a   Okada, Ikuo ^a   Matsuo, Seitaro ^a  

^a NTT CORPORATION   (Japan)

^b Advanced Film Technology Inc   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRON CYCLOTRON RESONANCE; FILMS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HEAT TREATMENT; IRRADIATION; MASKS; MICROWAVES; PLASMA SOURCES; REFRACTIVE INDEX; SILICON CARBIDE; THERMAL EFFECTS;

PATTERN REPLICATION; X RAY MASK MEMBRANE;

X RAY LITHOGRAPHY;

EID: 0031145715     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589378     Document Type: Article

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